Lakai Holdings is actively involved in the development of various technologies based on the results of its fundamental research in plasma physics and high-power microwave processes. Currently Lakai uses two prototype systems, each of which covers a specific range of applications. Both systems are built around a klystron-based microwave plasma source and are among the most powerful microwave plasma systems in their class in the world. 

Having assembled and built unique research equipment, Lakai has employed a group of experts with more than 330 years of combined experience, who have performed cutting-edge experiments over the last four years in the areas of CVD diamond film and high-power microwave plasma sources. As a result of this research, Lakai has developed various microwave-based electronic devices and complexes for scientific, industrial and military applications and is positioned today as the world leader in the development of these technologies. 

Experts predict that diamond films will play a significant role in the future in the microelectronics, optics, space and aviation industries, et al, because of the unique properties of diamond, which are superior in many respects to other materials. Wide use of diamond films has been retarded due to the high cost of producing diamond films and the limited capacity of devices used for the production of such films. An important objective of our project has been to develop universal industrial systems for producing diamond films, using CVD technology with relatively simple operation and not requiring highly qualified personnel. These systems will be fully automated in the future. 

Lakai’s technical discoveries and know-how provide solutions to existing problems in CVD technology. Specifically, Lakai has achieved stability of high-power plasma in a non-resonance cavity and the use of impulse mode in our power-generating devices. These technical achievements provide for better plasma properties, longer life span for key components and substantial reduction in the cost of diamond films, making feasible the wide and cost-effective use of Lakai CVD technology for industrial applications.

Lakai's smaller one-channel system (" PI-1 ") is capable of producing CVD diamond film on a substrate of about 300-350 mm in diameter, which is sufficient for most applications. The PI-1 system is relatively cheap and therefore can be mass produced for use in various industrial applications. 

The PI-1 system also serves as a test device for the study and development of techniques and hardware solutions for Lakai's larger and more complicated eight-channel system ("PI-8"). This multichannel camera provides a unique facility for experiments not only in CVD technology, but also for experiments in microwave plasma and the use of plasma properties for the development of other technologies. PI-8 can also be used for testing various equipment in super-extreme environmental conditions.

Besides being active in CVD and plasma research and technology development, Lakai also devotes substantial resources to R&D of electrodynamic devices, which can be used, inter alia, for:

• producing scanning diagrams of active antenna arrays with practically unlimited speed (even exceeding the speed of light);

• producing ultra-short impulses formed by adding poly-frequency coherent waves from multi-channel sources of continuous or impulse emission;

• forming an impulse signal on an emitting antenna array from a multi-channel source of a poly-frequency coherent wave source;

• increase of effective range of radar through forming ultra-high-power impulses.

This effort has produced astonishing results, which have allowed Lakai, using state-of-the-art components, to extend the known horizons for the use of high-power impulse microwave devices and solutions on a cost-effective basis.

Lakai's expertise in high-power microwave sources is undoubtedly of great interest to the defense industry, where special radioelectronic installations designed and built by Lakai can be used for radar systems, as well as the suppression of any flying object electronics within 5-10 miles from the source, et al.

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